Nanolayer deposition (NLD) is a patented approach for depositing thin conformal films that combines many of the favorable aspects of atomic layer deposition with the higher deposition rates associated with pulsed layer deposition. Tegal began developing NLD in the mid-1990s and has since been awarded six US patents pertaining to NLD processing, and 21 patents pertaining to NLD and ALD hardware, for its efforts.
This patent portfolio provides a unique, exploitable, and defendable intellectual property position in thin film deposition technology combining unique aspects of pulsed chemical vapor deposition (PCVD) and atomic layer deposition (ALD) technologies.
NLD is used to deposit metals and dielectric films at higher rates with considerably higher conformality than conventional CVD. Many metallorganic precursors are available today that are compatible with NLD technology and most existing ALD hardware sets that are capable of delivering MOCVD precursors are compatible with NLD.
Pulsed Layer Deposition
Pulsed Layer Deposition (PLD) is a process for depositing thin films in which pulsed power is delivered to a constant flow of precursor gas to periodically activate the deposition process. Pulsing provides improved conformality relative to continuous MOCVD processes. Tegal has been awarded two PLD patents.
Cu Barrier and Adhesion Layer Deposition
A number of techniques for depositing engineered adhesion and diffusion barrier layers for copper metallization technology have been developed at Tegal for which patents have been awarded. These patents include graded adhesion layers, nitrided diffusion barriers, and methods for damage-free deposition on sensitive low-k dielectrics.
"NLD" and "Nanolayer Deposition" are trademarks of Tegal Corporation. "NLD" is a registered trademark.
Tegal is currently marketing this valuable NLD intellectual property portfolio to interested third-parties.
For more information, please contact: Robert Ditizio, Senior Director, R&D | Tegal Corporation, 140 Second Street, Suite 318, Petaluma CA 94952 | 707 765 5617 | This e-mail address is being protected from spambots. You need JavaScript enabled to view it.